JPH046106B2 - - Google Patents
Info
- Publication number
- JPH046106B2 JPH046106B2 JP57086627A JP8662782A JPH046106B2 JP H046106 B2 JPH046106 B2 JP H046106B2 JP 57086627 A JP57086627 A JP 57086627A JP 8662782 A JP8662782 A JP 8662782A JP H046106 B2 JPH046106 B2 JP H046106B2
- Authority
- JP
- Japan
- Prior art keywords
- thin film
- semiconductor thin
- mos transistor
- gate
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
- H10D30/60—Insulated-gate field-effect transistors [IGFET]
Landscapes
- Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
- Semiconductor Memories (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP57086627A JPS58204568A (ja) | 1982-05-24 | 1982-05-24 | 半導体装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP57086627A JPS58204568A (ja) | 1982-05-24 | 1982-05-24 | 半導体装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS58204568A JPS58204568A (ja) | 1983-11-29 |
JPH046106B2 true JPH046106B2 (en]) | 1992-02-04 |
Family
ID=13892260
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP57086627A Granted JPS58204568A (ja) | 1982-05-24 | 1982-05-24 | 半導体装置 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS58204568A (en]) |
Families Citing this family (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0640573B2 (ja) * | 1983-12-26 | 1994-05-25 | 株式会社日立製作所 | 半導体集積回路装置 |
US5208657A (en) * | 1984-08-31 | 1993-05-04 | Texas Instruments Incorporated | DRAM Cell with trench capacitor and vertical channel in substrate |
US4824793A (en) * | 1984-09-27 | 1989-04-25 | Texas Instruments Incorporated | Method of making DRAM cell with trench capacitor |
US5102817A (en) * | 1985-03-21 | 1992-04-07 | Texas Instruments Incorporated | Vertical DRAM cell and method |
US5164917A (en) * | 1985-06-26 | 1992-11-17 | Texas Instruments Incorporated | Vertical one-transistor DRAM with enhanced capacitance and process for fabricating |
US4829017A (en) * | 1986-09-25 | 1989-05-09 | Texas Instruments Incorporated | Method for lubricating a high capacity dram cell |
US4839707A (en) * | 1987-08-27 | 1989-06-13 | Hughes Aircraft Company | LCMOS displays fabricated with implant treated silicon wafers |
US5109259A (en) * | 1987-09-22 | 1992-04-28 | Texas Instruments Incorporated | Multiple DRAM cells in a trench |
US5225363A (en) * | 1988-06-28 | 1993-07-06 | Texas Instruments Incorporated | Trench capacitor DRAM cell and method of manufacture |
US5105245A (en) * | 1988-06-28 | 1992-04-14 | Texas Instruments Incorporated | Trench capacitor DRAM cell with diffused bit lines adjacent to a trench |
JPH0579358A (ja) * | 1991-09-18 | 1993-03-30 | Matsushita Electric Ind Co Ltd | スロツトル開度制御装置及び車両用定速走行装置 |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5543624B2 (en]) * | 1975-01-29 | 1980-11-07 | ||
JPS5543625B2 (en]) * | 1975-01-29 | 1980-11-07 | ||
JPS6036106B2 (ja) * | 1978-09-20 | 1985-08-19 | 富士通株式会社 | 半導体記憶装置 |
JPS56107571A (en) * | 1980-01-30 | 1981-08-26 | Fujitsu Ltd | Semiconductor memory storage device |
-
1982
- 1982-05-24 JP JP57086627A patent/JPS58204568A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS58204568A (ja) | 1983-11-29 |
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